| 1. Week |
Development of crystal growth. |
|
| 1. Week |
Development of crystal growth. |
|
| 2. Week |
Growth of liquid phase. |
|
| 2. Week |
Growth of liquid phase. |
|
| 3. Week |
Silicon and GaAs growth methods. |
|
| 3. Week |
Silicon and GaAs growth methods. |
|
| 4. Week |
Czochralski and Brigman techniques. |
|
| 4. Week |
Czochralski and Brigman techniques. |
|
| 5. Week |
Czochralski and Brigman techniques. |
|
| 5. Week |
Czochralski and Brigman techniques. |
|
| 6. Week |
Epitaxial growth. |
|
| 6. Week |
Epitaxial growth. |
|
| 7. Week |
Epitaxial growth, Ultra-high vacuum conditions and techniques. |
|
| 7. Week |
Epitaxial growth, Ultra-high vacuum conditions and techniques. |
|
| 8. Week |
MIDTERM EXAM |
|
| 8. Week |
MIDTERM EXAM |
|
| 9. Week |
Kinetic Theory of Gases. |
|
| 9. Week |
Kinetic Theory of Gases. |
|
| 10. Week |
Chemical vapor deposition/epitaxy (CVD). |
|
| 10. Week |
Chemical vapor deposition/epitaxy (CVD). |
|
| 11. Week |
Epitaxy Metalorganik chemical vapor (MOCVD) techniques. |
|
| 11. Week |
Epitaxy Metalorganik chemical vapor (MOCVD) techniques. |
|
| 12. Week |
Molecular beam Epitaxy (MBE). |
|
| 12. Week |
Molecular beam Epitaxy (MBE). |
|
| 13. Week |
Molecular beam Epitaxy (MBE). |
|
| 13. Week |
Molecular beam Epitaxy (MBE). |
|
| 14. Week |
Internal measurement techniques: RHEED, AES and the ellipsometer, the mass spectrometer |
|
| 14. Week |
Internal measurement techniques: RHEED, AES and the ellipsometer, the mass spectrometer |
|